License: Creative Commons Attribution 4.0 International license (CC BY 4.0)
When quoting this document, please refer to the following
DOI: 10.4230/LIPIcs.STACS.2021.45
URN: urn:nbn:de:0030-drops-136905
URL: http://dagstuhl.sunsite.rwth-aachen.de/volltexte/2021/13690/
Jin, Ce ;
Nelson, Jelani ;
Wu, Kewen
An Improved Sketching Algorithm for Edit Distance
Abstract
We provide improved upper bounds for the simultaneous sketching complexity of edit distance. Consider two parties, Alice with input x ∈ Σⁿ and Bob with input y ∈ Σⁿ, that share public randomness and are given a promise that the edit distance ed(x,y) between their two strings is at most some given value k. Alice must send a message sx and Bob must send sy to a third party Charlie, who does not know the inputs but shares the same public randomness and also knows k. Charlie must output ed(x,y) precisely as well as a sequence of ed(x,y) edits required to transform x into y. The goal is to minimize the lengths |sx|, |sy| of the messages sent.
The protocol of Belazzougui and Zhang (FOCS 2016), building upon the random walk method of Chakraborty, Goldenberg, and Koucký (STOC 2016), achieves a maximum message length of Õ(k⁸) bits, where Õ(⋅) hides poly(log n) factors. In this work we build upon Belazzougui and Zhang’s protocol and provide an improved analysis demonstrating that a slight modification of their construction achieves a bound of Õ(k³).
BibTeX - Entry
@InProceedings{jin_et_al:LIPIcs.STACS.2021.45,
author = {Jin, Ce and Nelson, Jelani and Wu, Kewen},
title = {{An Improved Sketching Algorithm for Edit Distance}},
booktitle = {38th International Symposium on Theoretical Aspects of Computer Science (STACS 2021)},
pages = {45:1--45:16},
series = {Leibniz International Proceedings in Informatics (LIPIcs)},
ISBN = {978-3-95977-180-1},
ISSN = {1868-8969},
year = {2021},
volume = {187},
editor = {Bl\"{a}ser, Markus and Monmege, Benjamin},
publisher = {Schloss Dagstuhl -- Leibniz-Zentrum f{\"u}r Informatik},
address = {Dagstuhl, Germany},
URL = {https://drops.dagstuhl.de/opus/volltexte/2021/13690},
URN = {urn:nbn:de:0030-drops-136905},
doi = {10.4230/LIPIcs.STACS.2021.45},
annote = {Keywords: edit distance, sketching}
}
Keywords: |
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edit distance, sketching |
Collection: |
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38th International Symposium on Theoretical Aspects of Computer Science (STACS 2021) |
Issue Date: |
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2021 |
Date of publication: |
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10.03.2021 |